Publications of VALIEV IPT RAS, YB members for 2023 year
- Grushevsky E.A., Savinsky N.G., Smirnova M.A., Puhov D.E., Selyukov R.V. The Plasna Assistant Cathodic Electro-Chemical Exfoliation of Graphite. High Energy Chemistry, V 57 (2023), supplement issue 1, S64–S67. DOI: 10.1134/S0018143923070147
- Bulgakov A.V., Beránek J., Volodin V.A., Cheng Y., Levy Y., Nagisetty S.S., Zukerstein M., Popov A.A., Bulgakova N.M. Ultrafast Infrared Laser Crystallization of Amorphous Si/Ge Multilayer Structures. Materials 2023, 16, 3572. DOI: 10.3390/ma16093572
- Volodin V.A., Cheng Y., Bulgakov A.V., Levy Y., Beránek J., Nagisetty S.S., Zukerstein M., Popov A.A., Bulgakova N.M. Single-shot selective femtosecond and picosecond infrared laser crystallization of an amorphous Ge/Si multilayer stack. Optics & Laser Technology. Volume 161, June 2023, 109161. DOI: 10.1016/j.optlastec.2023.109161
- Postnikov A.V. Quantitative phase-amplitude surface determination in reflection differential interference contrast profilometry. Applied Optics (2023) Vol. 62, Issue 17, pp. 4557-4562. DOI: 10.1364/AO.491470
- S. Rasool, K.Saritha, K.T.R. Reddy, M. S. Tivanov, O.V. Korolik, V.F. Gremenok, S.P. Zimin and I.I. Amirov. Effect of Ar-plasma treatment and annealingon thermally evaporated β-In2S3 thin films. Adv. Nat. Sci.: Nanosci. Nanotechnol. 14 (2023) 025010 (8pp) DOI: 10.1088/2043-6262/acd684
- Postnikov A.V., Uvarov I.V., Svetovoy V.B. Experimental setup for measuring the dispersion forces by the adhered cantilever method // Review of Scientific Instruments. – 2023. – Vol. 94. – 043907., DOI: 10.1063/5.0147016
- A.M. Efremov, I.I. Amirov, M.O. Izyumov. Gas-phase parameters and densities of atomic species in Cl2 + O2 + Ar plasma: Effects of O2/Ar and Cl2/Ar mixing ratios. Vacuum. V. 207, 2023, 111664. DOI: 10.1016/j.vacuum.2022.111664
- D. Voloshin, T. Rakhimova, A Kropotkin, I. Amirov, M. Izyumov, D. Lopaev, A.Zotovich and S. Ziryanov. Plasma density determination from ion current to cylindrical Langmuir probe with validation on hairpin probe measurements. Plasma Sources Sci. Technol. 32 (2023) 044001 (12pp) DOI: 10.1088/1361-6595/acc355